Large Ti:Sapphire Laser Mirror @800nm; AOI 45deg. D=155mm. Thickness=45mm
Product Description
Large diameter HR dielectric mirror specifically engineered for Ti:Sapphire femtosecond pulse laser systems operating around 800 nm.
This mirror features high reflectivity greater than 99% and is designed for 45-degree angle of incidence (AOI), making it useful for high-power laser beam steering.
Manufactured using advanced HfO2-SiO2 interference layers deposited via PVD technology on a fused silica substrate, this mirror offers excellent thermal stability, high damage threshold, and minimal wavefront distortion.
The large 155mm diameter and 45mm thickness provide mechanical stability and minimize thermal effects in high-power applications. The back surface is matte finished.
Perfect for ultrafast laser systems, scientific research laboratories, and industrial applications requiring high-performance optics for Ti:Sapphire lasers.
Manufactured in EU.
Technical Specifications
| Central Wavelength | 790-800 nm |
| Reflectivity | > 99% |
| Angle of Incidence | 45° |
| Spectral Range @45° | 760-840 nm |
| Spectral Range @0° | 820-980 nm |
| Diameter | 155 mm |
| Thickness | 45 mm / 55mm |
| Substrate Material | Fused Silica |
| Coating Materials | HfO2-SiO2 interference layers |
| Rear Surface | Matte finish |
| Manufacturing | PVD Technology |
| Origin | Manufactured in EU |