Ti:Sapphire Laser HR Mirror @800 nm - 45° AOI - Φ60mm Mounted
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For custom coating runs, higher LIDT requirements or unmounted optics, please contact us via email.
For custom coating runs, higher LIDT requirements or unmounted optics, please contact us via email.
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Product Description
High-reflectivity dielectric mirror optimized for Ti:Sapphire laser systems centered at 800 nm, designed for 45° Angle of Incidence.
- HR: R > 99% @ 800 nm
- AOI: 45°
- Substrate: Fused Silica
- Coating: HfO₂ / SiO₂ dielectric multilayer
- Mount: Aluminum protective frame – Φ60 mm
Typical Applications:
• Folding mirror in Ti:Sapphire resonators
• Beam steering in femtosecond CPA systems
• Regenerative amplifier routing
• CW laboratory systems
Back surface may show cosmetic marks that do not affect optical performance.
Technical Specifications
| Central Wavelength | 800 nm |
| Angle of Incidence | 45° |
| Diameter | 60 mm (mounted) |
| Substrate | Fused Silica |
| Reflectivity | R > 99% |
| Coating Type | Hard Dielectric (HfO₂ / SiO₂) |
| Manufacturing | Electron Beam PVD |
| Origin | Manufactured in EU |